콘텐츠로 건너뛰기
Merck
모든 사진(1)

Key Documents

679208

Sigma-Aldrich

Methyltrichlorosilane

deposition grade, ≥98% (GC), ≥99.99% (as metals)

동의어(들):

Trichloro(methyl)silane

로그인조직 및 계약 가격 보기


About This Item

Linear Formula:
CH3SiCl3
CAS Number:
Molecular Weight:
149.48
Beilstein:
1361381
EC Number:
MDL number:
UNSPSC 코드:
12352103
PubChem Substance ID:
NACRES:
NA.23

Grade

deposition grade

vapor density

5.2 (vs air)

vapor pressure

150 mmHg ( 25 °C)

분석

≥98% (GC)
≥99.99% (as metals)

형태

liquid

autoignition temp.

>760 °F

expl. lim.

11.9 %

refractive index

n20/D 1.411 (lit.)

bp

66 °C (lit.)

density

1.273 g/mL at 25 °C (lit.)

SMILES string

C[Si](Cl)(Cl)Cl

InChI

1S/CH3Cl3Si/c1-5(2,3)4/h1H3

InChI key

JLUFWMXJHAVVNN-UHFFFAOYSA-N

유사한 제품을 찾으십니까? 방문 제품 비교 안내

픽토그램

FlameSkull and crossbonesCorrosion

신호어

Danger

유해 및 위험 성명서

Hazard Classifications

Acute Tox. 3 Inhalation - Acute Tox. 4 Dermal - Acute Tox. 4 Oral - Eye Dam. 1 - Flam. Liq. 2 - Skin Corr. 1A - STOT SE 3

표적 기관

Respiratory system

Storage Class Code

3 - Flammable liquids

WGK

WGK 1

Flash Point (°F)

46.4 °F - closed cup

Flash Point (°C)

8 °C - closed cup


시험 성적서(COA)

제품의 로트/배치 번호를 입력하여 시험 성적서(COA)을 검색하십시오. 로트 및 배치 번호는 제품 라벨에 있는 ‘로트’ 또는 ‘배치’라는 용어 뒤에서 찾을 수 있습니다.

이 제품을 이미 가지고 계십니까?

문서 라이브러리에서 최근에 구매한 제품에 대한 문서를 찾아보세요.

문서 라이브러리 방문

Yingbin Ge et al.
The journal of physical chemistry. A, 111(8), 1475-1486 (2007-02-06)
The kinetics for the previously proposed 114-reaction mechanism for the chemical vapor deposition (CVD) process that leads from methyltrichlorosilane (MTS) to silicon carbide (SiC) are examined. Among the 114 reactions, 41 are predicted to proceed with no intervening barrier. For
W H Mullen et al.
Clinica chimica acta; international journal of clinical chemistry, 157(2), 191-198 (1986-06-15)
An enzyme electrode is described based upon the enzyme lactate oxidase (EC 1.1.3.2) coupled to an H2O2 sensor. Use of an organosilane-treated microporous membrane over the enzyme layer, allows responses linear to 18 mmol/l L-lactate with response times of 1-3
Ildikó Szabó et al.
Biopolymers, 88(1), 20-28 (2006-10-26)
Rearrangement of disulfide bonds during the synthesis of alpha-conotoxin GI using PhS(O)Ph/CH(3)SiCl(3) oxidation procedure was observed. We have demonstrated that the protecting scheme (order of acetamidomethyl (Acm) and (t)Bu protecting groups) of the Cys residues as well as the reaction
Yingbin Ge et al.
The journal of physical chemistry. A, 114(6), 2384-2392 (2010-01-29)
The rate constants for the gas-phase reactions in the silicon carbide chemical vapor deposition of methyltrichlorosilane (Ge, Y. B.; Gordon, M. S.; Battaglia, F.; Fox, R. O. J. Phys. Chem. A 2007, 111, 1462.) were calculated. Transition state theory was
Ana Gisela Cunha et al.
Journal of colloid and interface science, 344(2), 588-595 (2010-02-05)
This work describes a very simple, rapid, and efficient approach to the hydrophobization and lipophobization of cellulose fibers through their reaction with gaseous trichloromethylsilane (TCMS). The characterization of the modified surface involved FTIR-ATR and solid-state (29)Si NMR spectroscopy, scanning electron

문서

Deposition Grade Silanes, fully characterized by chemical analysis and nuclear magnetic resonance (NMR) with greater than 98% purity, for Sol-Gel Processes.

Reactive silicone chemistry: Focus on pure silicon production, polymerizations, and controlled stereochemistry reactions.

atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer

Silica's versatility spans various industries, including biomedical applications.

모두 보기

자사의 과학자팀은 생명 과학, 재료 과학, 화학 합성, 크로마토그래피, 분석 및 기타 많은 영역을 포함한 모든 과학 분야에 경험이 있습니다..

고객지원팀으로 연락바랍니다.