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Deposition and Semiconductor Materials
Copper(I) oxide Cu2O 97%, ≤7 μm 1317-39-1 208825
≥99.99% trace metals basis,
anhydrous
566284
Copper(II) oxide CuO 99.999% trace metals basis 1317-38-0 203130
Nickel(II) oxide NiO ≥99.995%