Skip to Content
Merck
All Photos(1)

Key Documents

View All Documentation

579211

Sigma-Aldrich

Tetrakis(dimethylamido)zirconium(IV)

electronic grade, ≥99.99% trace metals basis

Synonym(s):

TDMAZ, Tetrakis(dimethylamino)zirconium(IV)

Sign Into View Organizational & Contract Pricing
All Photos(1)

About This Item

Linear Formula:
[(CH3)2N]4Zr
CAS Number:
19756-04-8
Molecular Weight:
267.53
MDL number:
MFCD00239502
UNSPSC Code:
12352103
PubChem Substance ID:
24880977
NACRES:
NA.23

grade

electronic grade

Assay

≥99.99% trace metals basis

form

solid

reaction suitability

core: zirconium

mp

57-60 °C (lit.)

storage temp.

2-8°C

SMILES string

CN(C)[Zr](N(C)C)(N(C)C)N(C)C

InChI

1S/4C2H6N.Zr/c4*1-3-2;/h4*1-2H3;/q4*-1;+4

InChI key

DWCMDRNGBIZOQL-UHFFFAOYSA-N

Looking for similar products? Visit Product Comparison Guide

Application

Tetrakis(dimethylamido) zirconium (IV) may be used as a precursor for atomic layer deposition of zirconium which find applications ranging from gas sensors to high-k dielectrics in microelectronics.

Pictograms

FlameExclamation mark
GHS02,GHS07

Signal Word

Danger

Hazard Statements

H228,H261,H315,H319,H335

Hazard Classifications

Eye Irrit. 2 - Flam. Sol. 1 - Skin Irrit. 2 - STOT SE 3 - Water-react 2

Target Organs

Respiratory system

Supplementary Hazards

EUH014

Storage Class Code

4.3 - Hazardous materials which set free flammable gases upon contact with water

WGK

WGK 3

Flash Point(F)

No data available

Flash Point(C)

No data available

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

Atomic layer deposition of ZrO2 and HfO2 nanotubes by template replication
Gu D, et al.
Electrochemical and Solid-State Letters, 12.4, K25-K28 (2009)
Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films.
Hausmann DM & Gordon RG
Journal of Crystal Growth, 249.1, 251-261 (2003)

Articles

Nanostructured Catalyst for Direct Alcohol Low-Temperature Fuel Cells

Learn about the different low temperature direct alcohol fuel cells based on nanostructured material catalysts and anion exchange membrane fuel cells.

How to Best Store Electrical Energy

This article describes the use and advantages of polyoxometalate-based redox-flow batteries as electrochemical energy storage systems over Li-ion batteries.

Materials for Thin Film SOFCs

Thin film solid oxide fuel cells offer technical advantages; review of TF-SOFC deposition methods for electrolyte thin films.

Dye-Sensitized and Perovskite Solar Cells

Continuous efficiency improvements in photovoltaic devices result from material advancements and manufacturing innovation.

See All

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service