Skip to Content
Merck
All Photos(1)

Documents

289388

Sigma-Aldrich

Silicon tetrachloride

99.998% trace metals basis

Synonym(s):

STC, Tetrachlorosilane

Sign Into View Organizational & Contract Pricing
All Photos(1)

About This Item

Linear Formula:
SiCl4
CAS Number:
10026-04-7
Molecular Weight:
169.90
EC Number:
233-054-0
MDL number:
MFCD00011229
UNSPSC Code:
12352103
PubChem Substance ID:
24857194
NACRES:
NA.23

vapor density

5.86 (vs air)

vapor pressure

420 mmHg ( 37.7 °C)

Assay

99.998% trace metals basis

form

liquid

reaction suitability

core: silicon

bp

57.6 °C (lit.)

mp

−70 °C (lit.)

density

1.483 g/mL at 25 °C (lit.)

SMILES string

Cl[Si](Cl)(Cl)Cl

InChI

1S/Cl4Si/c1-5(2,3)4

InChI key

FDNAPBUWERUEDA-UHFFFAOYSA-N

Looking for similar products? Visit Product Comparison Guide

Related Categories

Application

Semiconductor grade

Pictograms

Skull and crossbonesCorrosion
GHS06,GHS05

Signal Word

Danger

Hazard Statements

H301 + H331,H314,H335

Hazard Classifications

Acute Tox. 3 Inhalation - Acute Tox. 3 Oral - Eye Dam. 1 - Skin Corr. 1A - STOT SE 3

Target Organs

Respiratory system

Supplementary Hazards

EUH014,EUH071

Storage Class Code

6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects

WGK

WGK 1

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

Takayuki Kurashina et al.
Dalton transactions (Cambridge, England : 2003), (28)(28), 5542-5550 (2009-07-10)
The title compound with the formula (Me2NH2)13H5[{alpha2-P2W17O61(Si2O)}3(micro-O)3].39H2O Me2NH(2)-1 was obtained in 12.8% (0.258 g scale) yield by a 1:2 molar ratio reaction of alpha2-mono-lacunary Dawson polyoxometalate (POM) [alpha2-P2W17O61]10- with SiCl4 in water and unequivocally characterized by complete elemental analysis, TG/DTA
C Schulze Isfort et al.
Toxicology letters, 186(3), 148-151 (2008-12-31)
Synthetic nanoscaled metal oxides are mainly produced by pyrogenic decomposition of precursors in the gas phase using a hot-wall or plasma reactor. Due to their low production rate and limited scalability, these processes are of minor technical relevance in manufacturing
Baker Jawabrah Al-Hourani et al.
Bioorganic & medicinal chemistry letters, 22(6), 2235-2238 (2012-02-22)
A series of novel 5-substituted 1H-tetrazoles as cyclooxygenase-2 (COX-2) inhibitors was prepared via treatment of various diaryl amides with tetrachlorosilane/sodium azide. All compounds were tested in cyclooxygenase (COX) assays in vitro to determine COX-1 and COX-2 inhibitory potency and selectivity.
Carlos Santos et al.
Sensors (Basel, Switzerland), 15(6), 12454-12473 (2015-05-30)
One of the main challenges in wireless cyber-physical systems is to reduce the load of the communication channel while preserving the control performance. In this way, communication resources are liberated for other applications sharing the channel bandwidth. The main contribution
K M Sivanandaiah et al.
International journal of peptide and protein research, 45(4), 377-379 (1995-04-01)
Deprotection of the tert-butoxycarbonyl group during solid-phase synthesis of peptides can be conveniently and efficiently carried out using a neutral reagent, silicon tetrachloride/sodium iodide (iodotrichlorosilane). This simple and rapid method has been advantageously employed during the solid-phase synthesis of the
View All Related Papers

Articles

Chemistry in Flames: From Oxide to Salt and Metal Nanoparticles

Flame spray synthesis allows the scalable fabrication of many mixed oxide, salt, metal, carbon-coated metal, silica-coated metal oxide or even metal-ceramic composite nanoparticles.

Silicon Nitride Atomic Layer Deposition: A Brief Review of Precursor Chemistry

atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer

Progress in Spintronic Materials

Spintronics offer breakthroughs over conventional memory/logic devices with lower power, leakage, saturation, and complexity.

Synthesis of Melting Gels Using Mono-Substituted and Di-Substituted Alkoxysiloxanes

Hybrid organic-inorganic sol-gel materials containing silica were first called “ORMOSILs” in 1984.

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service