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472352

Sigma-Aldrich

Poly(4-vinylpyridine)

average Mw ~160,000

Synonym(s):

4-Vinylpyridine polymer, Poly(p -vinylpyridine)

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About This Item

Linear Formula:
(C7H7N)n
CAS Number:
25232-41-1
MDL number:
MFCD00190588
UNSPSC Code:
12162002
PubChem Substance ID:
24870798
NACRES:
NA.23

mol wt

average Mw ~160,000

Quality Level

200

transition temp

Tg 142 °C (onset, annealed)

solubility

DMF, acetic acid and lower alcohols: soluble

SMILES string

n1ccc(cc1)C=C

InChI

1S/C7H7N/c1-2-7-3-5-8-6-4-7/h2-6H,1H2

InChI key

KFDVPJUYSDEJTH-UHFFFAOYSA-N

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Application

Poly(4-vinylpyridine) can be used:
  • To prepare metal-containing polymer, applicable as nonlinear optically active material.
  • For the removal of perchlorate from an aqueous solution.
It can also be incorporated into active layers of organic solar cells to enhance power conversion efficiency.

Storage Class Code

11 - Combustible Solids

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

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Certificates of Analysis (COA)

Lot/Batch Number
MKCX3415
MKCX3211
MKCW8875
MKCX0519
MKCW5743

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4-Vinylpyridine contains 100 ppm hydroquinone as inhibitor, 95%

Sigma-Aldrich

V3204

4-Vinylpyridine

Rita Rodrigues et al.
Materials (Basel, Switzerland), 7(12), 8189-8196 (2014-12-22)
We report on the efficiency improvement of organic solar cells (OPVs) based on the low energy gap polyfluorene derivative, APFO-3, and the soluble C60 fullerene PCBM, upon addition of a residual amount of poly (4-vinylpyridine) (PVP). We find that the
Biomimetic surface coatings for atmospheric water capture prepared by dewetting of polymer films.
Stuart C Thickett et al.
Advanced materials (Deerfield Beach, Fla.), 23(32), 3718-3722 (2011-07-19)
Hui Wang et al.
Journal of colloid and interface science, 365(1), 178-183 (2011-10-04)
A general method has been developed to determine the ionization constants of polymer thin films based on the stimuli-responsiveness of the polymer. Robust polymer films were fabricated on silicon wafers and gold slides using perfluorophenyl azide (PFPA) as the coupling
Sampa Saha et al.
ACS applied materials & interfaces, 3(8), 3042-3048 (2011-07-07)
Atom transfer radical polymerization (ATRP) is commonly used to grow polymer brushes from Au surfaces, but the resulting film thicknesses are usually significantly less than with ATRP from SiO(2) substrates. On Au, growth of poly(methyl methacrylate) (PMMA) blocks from poly(tert-butyl
Christy D Petruczok et al.
Advanced materials (Deerfield Beach, Fla.), 24(48), 6445-6450 (2012-09-27)
A simple, efficient, and scalable method for patterning microstructures on curved substrates is demonstrated. Initiated chemical vapor deposition is used to synthesize a thin film that crosslinks upon UV exposure. Polymeric features are defined on glass rods with high curvature
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