Skip to Content
Merck
All Photos(1)

Key Documents

View All Documentation

Safety Information

469947

Sigma-Aldrich

Tris(dimethylamido)aluminum(III)

Synonym(s):

Hexakis(dimethylamido)dialuminum, Tris(dimethylamino)alane dimer

Sign Into View Organizational & Contract Pricing
All Photos(1)

About This Item

Linear Formula:
Al(N(CH3)2)3
CAS Number:
32093-39-3
Molecular Weight:
159.21
MDL number:
MFCD00269811
UNSPSC Code:
12352103
PubChem Substance ID:
24870625
NACRES:
NA.23

form

solid

Quality Level

100

reaction suitability

core: aluminum

mp

82-84 °C (lit.)

density

0.865 g/mL at 25 °C (lit.)

SMILES string

CN(C)[Al](N(C)C)N(C)C.CN(C)[Al](N(C)C)N(C)C

InChI

1S/6C2H6N.2Al/c6*1-3-2;;/h6*1-2H3;;/q6*-1;2*+3

InChI key

JGZUJELGSMSOID-UHFFFAOYSA-N

Looking for similar products? Visit Product Comparison Guide

General description

Atomic number of base material: 13 Aluminum

Application

Tris(dimethylamido)aluminum(III) may be used as a precursor to aluminum nitride (AlN) thin films by organometallic chemical vapor deposition (OMCVD).

Pictograms

FlameCorrosion
GHS02,GHS05

Signal Word

Danger

Hazard Statements

H260,H314

Hazard Classifications

Skin Corr. 1B - Water-react 1

Supplementary Hazards

EUH014

Storage Class Code

4.3 - Hazardous materials which set free flammable gases upon contact with water

WGK

WGK 3

Flash Point(F)

70.0 °F - closed cup

Flash Point(C)

21.1 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Regulatory Listings

Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.

FSL

Group 2: Flammable solids
Flammable solid
Hazardous rank III

JAN Code

469947-VAR:
469947-BULK:
469947-10G:

Choose from one of the most recent versions:

Certificates of Analysis (COA)

Lot/Batch Number
SHBM5898
SHBH1763V
SHBG5350V
SHBG0737V
SHBD7354V

Don't see the Right Version?

If you require a particular version, you can look up a specific certificate by the Lot or Batch number.

Search for a COA

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

Tris (dimethylamido) aluminum (III): An overlooked atomic layer deposition precursor.
Buttera SC, et al.
Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, And Films, 35(1), 01B128-01B128 (2017)

Articles

High Purity Metalorganic Precursors for CPV Device Fabrication

High Purity Metalorganic Precursors for CPV Device Fabrication

Atomic Layer Deposition of Nanomaterials for Li-Ion Batteries, Fuel Cells, and Solar Cells

Nanomaterials are considered a route to the innovations required for large-scale implementation of renewable energy technologies in society to make our life sustainable.

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service