Skip to Content
Merck
All Photos(1)

Key Documents

View All Documentation

Safety Information

651761

Sigma-Aldrich

Negative resist remover I

Sign Into View Organizational & Contract Pricing
All Photos(1)

About This Item

UNSPSC Code:
12352300
NACRES:
NA.23

shelf life

1 yr (cool area away from direct sunlight)

Quality Level

100

pH

<2 (20 °C)

bp

204-304 °C (lit.)

density

1.00 g/mL at 25 °C (lit.)

storage temp.

2-8°C

General description

Available as part of Negative Photoresist kit 654892
Low pH formulation for removal of photoresist cured onto various substrates. Non-corrosive to metals and oxides. Does not contain chlorinated hydrocarbons, chromates, phenol, or phosphates. Performs well at room and elevated temperatures.

Signal Word

Danger

Hazard Statements

H302,H304,H314,H351,H411

Hazard Classifications

Acute Tox. 4 Oral - Aquatic Chronic 2 - Asp. Tox. 1 - Carc. 2 - Eye Dam. 1 - Skin Corr. 1

Storage Class Code

8A - Combustible corrosive hazardous materials

WGK

WGK 3

Flash Point(F)

204.8 °F

Flash Point(C)

96 °C

Regulatory Listings

Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.

PRTR

Class I Designated Chemical Substances

ISHL Indicated Name

Substances Subject to be Indicated Names

ISHL Notified Names

Substances Subject to be Notified Names

JAN Code

651761-250ML:4548173913131
651761-BULK:
651761-VAR:

Choose from one of the most recent versions:

Certificates of Analysis (COA)

Lot/Batch Number
MKCR8695
MKCN0261
MKCM9918
MKCK5971
MKCK1587

Don't see the Right Version?

If you require a particular version, you can look up a specific certificate by the Lot or Batch number.

Search for a COA

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

Protocols

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service