774030
Zirconium(IV) oxide
sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis (excludes 2% HfO2)
Synonym(s):
Zirconia
About This Item
Assay
99.95% trace metals basis (excludes 2% HfO2)
form
powder
reaction suitability
core: zirconium
diam. × thickness
2.00 in. × 0.25 in.
bp
5000 °C (lit.)
mp
2700 °C (lit.)
density
5.89 g/mL at 25 °C (lit.)
SMILES string
O=[Zr]=O
InChI
1S/2O.Zr
InChI key
MCMNRKCIXSYSNV-UHFFFAOYSA-N
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Application
Zirconium oxide sputtering target can be used for physical vapor deposition of zirconia thin films for IT-SOFC, thermal barrier coatings, lead zirconium titanate (PZT) films for sensor applications and other zirconium containing films for different applications.
Storage Class Code
11 - Combustible Solids
WGK
nwg
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Regulatory Listings
Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.
ISHL Indicated Name
Substances Subject to be Indicated Names
ISHL Notified Names
Substances Subject to be Notified Names
JAN Code
774030-BULK:
774030-1EA:
774030-VAR:
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