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Safety Information

NIST2133

Phosphorus implant in silicon depth profile standard

NIST® SRM® 2133

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About This Item

UNSPSC Code:
41116107
NACRES:
NA.24

grade

certified reference material

Quality Level

100

packaging

pkg of each

manufacturer/tradename

NIST®

application(s)

semiconductor

format

matrix material

Related Categories

General description

The SRM contains a single crystal silicon substrate measuring 1 cm × 1 cm, which is ion-implanted with the isotope 31P at a nominal energy of 100 keV.

SRM 2133_cert

SRM 2133_SDS

Application

The SRM is intended to calibrate the secondary ion response for minor and trace concentrations of phosphorus within a silicon matrix using the secondary ion mass spectrometry (SIMS) method.

Features and Benefits

  • Available with certificate documenting NIST-certified retained dose of 31P atoms which is obtained through radiochemical neutron activation analysis (RNAA).
  • The NIST certificate is provided with expiration certificate, storage, handling, use, and maintenance instructions.

Other Notes

Example analytes are listed below as a reference. Please download a current certificate at nist.gov/SRM for current analytes and certified values.
Phosphorus (31P)

Legal Information

NIST is a registered trademark of National Institute of Standards and Technology
SRM is a registered trademark of National Institute of Standards and Technology

Storage Class Code

13 - Non Combustible Solids

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Regulatory Listings

Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.

JAN Code

NIST2133:

Choose from one of the most recent versions:

Certificates of Analysis (COA)

Lot/Batch Number

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