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Key Documents

217069

Sigma-Aldrich

Hexamethyldisilane

98%

Synonym(s):

Permethyldisilane, Trimethyl(trimethylsilyl)silane

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About This Item

Linear Formula:
(Si(CH3)3)2
CAS Number:
Molecular Weight:
146.38
Beilstein:
1633463
EC Number:
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.23

Assay

98%

form

liquid

refractive index

n20/D 1.422 (lit.)

bp

112-114 °C (lit.)

mp

9-12 °C (lit.)

density

0.715 g/mL at 25 °C (lit.)

SMILES string

C[Si](C)(C)[Si](C)(C)C

InChI

1S/C6H18Si2/c1-7(2,3)8(4,5)6/h1-6H3

InChI key

NEXSMEBSBIABKL-UHFFFAOYSA-N

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Application

Silylating reagent for allylic acetates, aryl halides, and diketones. Source material for vapor deposition during silicon carbide growth.
Source material for vapor deposition during silicon carbide growth.

Pictograms

FlameExclamation mark

Signal Word

Danger

Hazard Statements

Hazard Classifications

Eye Irrit. 2 - Flam. Liq. 2 - Skin Sens. 1 - STOT SE 3

Target Organs

Respiratory system

Storage Class Code

3 - Flammable liquids

WGK

WGK 3

Flash Point(F)

21.2 °F

Flash Point(C)

-6 °C

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Thin Solid Films, 252, 13-13 (1994)
Journal of Organometallic Chemistry, 446, 135-135 (1993)
Chemistry Letters (Jpn), 2, 315-315 (1993)
The Journal of Organic Chemistry, 58, 3607-3607 (1993)
Thin Solid Films, 252, 13-13 (1994)

Articles

atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer

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