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Merck
모든 사진(2)

문서

339113

Sigma-Aldrich

Tantalum(V) ethoxide

99.98% trace metals basis

동의어(들):

Pentaethoxytantalum, Pentaethyl tantalate, Tantalum ethylate, Tantalum pentaethoxide, Tantalum(V) ethoxide

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About This Item

Linear Formula:
Ta(OC2H5)5
CAS Number:
Molecular Weight:
406.25
Beilstein:
3678999
MDL number:
UNSPSC 코드:
12352103
PubChem Substance ID:
NACRES:
NA.23

Quality Level

분석

99.98% trace metals basis

형태

liquid

반응 적합성

core: tantalum
reagent type: catalyst

불순물

<2 wt. % toluene

refractive index

n20/D 1.487 (lit.)

bp

155 °C/0.01 mmHg (lit.)

mp

21 °C (lit.)

density

1.566 g/mL at 25 °C (lit.)

SMILES string

CCO[Ta](OCC)(OCC)(OCC)OCC

InChI

1S/5C2H5O.Ta/c5*1-2-3;/h5*2H2,1H3;/q5*-1;+5

InChI key

HSXKFDGTKKAEHL-UHFFFAOYSA-N

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일반 설명

Tantalum(V) ethoxide Ta(OC2H5)5 is a tantalum alkoxide that can be used as a precursor in the preparation of tantalum oxide by chemical vapor deposition (CVD). It has excellent volatility and thermal stability. It can be synthesized by anodic oxidation of tantalum plate in anhydrous ethanol.

애플리케이션

Ta(OC2H5)5 can be used in the formation of ultrathin tantalum oxide based capacitors. It can also be used as a liquid precursor in the preparation of tantalum carbide nanopowder for hard coating on metal surfaces.

픽토그램

Flame

신호어

Warning

유해 및 위험 성명서

Hazard Classifications

Flam. Liq. 3

Storage Class Code

3 - Flammable liquids

WGK

WGK 1

Flash Point (°F)

84.2 °F - closed cup

Flash Point (°C)

29 °C - closed cup

개인 보호 장비

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter


시험 성적서(COA)

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문서 라이브러리에서 최근에 구매한 제품에 대한 문서를 찾아보세요.

문서 라이브러리 방문

Leakage currents in amorphous Ta 2 O 5 thin films
Chiu F, et al.
Journal of Applied Physics, 81(10), 6911-6915 (1997)
The Electrosynthesis of Tantalum Ethoxide
Yang H, et al.
Electrochemistry, 82(9), 743-748 (2014)
Controlling the synthesis of TaC nanopowders by injecting liquid precursor into RF induction plasma
Ishigaki T, et al.
Science and Technology of Advanced Materials, 6(2), 111-111 (2005)
Ultrathin tantalum oxide capacitor dielectric layers fabricated using rapid thermal nitridation prior to low pressure chemical vapor deposition
Kamiyama S, et al.
Journal of the Electrochemical Society, 140(6), 1617-1625 (1993)
Jeffrey D Steinberg et al.
EJNMMI research, 4(1), 15-15 (2014-03-13)
Cerenkov luminescence imaging (CLI) is an emerging imaging technique where visible light emitted from injected beta-emitting radionuclides is detected with an optical imaging device. CLI research has mostly been focused on positive contrast imaging for ascertaining the distribution of the

문서

The properties of many devices are limited by the intrinsic properties of the materials that compose them.

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