759562
Tris(dimethylamino)silane
packaged for use in deposition systems
동의어(들):
Tris(dimethylamino)silane, (Me2N)3SiH, N,N,N′,N′,N′′, N′′-Hexamethylsilanetriamine, Tris(dimethylamido)silane, N,N,N′,N′,N′′,N′′-Hexamethylsilanetriamine, TDMAS
About This Item
추천 제품
분석
≥99.9% (GC)
양식
liquid
bp
142 °C (lit.)
mp
−90 °C (lit.)
density
0.838 g/mL at 25 °C (lit.)
SMILES string
CN(C)[SiH](N(C)C)N(C)C
InChI
1S/C6H19N3Si/c1-7(2)10(8(3)4)9(5)6/h10H,1-6H3
InChI key
TWVSWDVJBJKDAA-UHFFFAOYSA-N
유사한 제품을 찾으십니까? 방문 제품 비교 안내
관련 카테고리
일반 설명
애플리케이션
- As a silicon source for deposition of aluminum silicate on TiO2 anodes for dye-sensitized solar cells vis atomic layer deposition method.
- As a precursor to fabricate functionalized Si reinforced separators for Li-ion batteries.
신호어
Danger
유해 및 위험 성명서
Hazard Classifications
Acute Tox. 3 Dermal - Acute Tox. 3 Inhalation - Acute Tox. 4 Oral - Eye Dam. 1 - Flam. Liq. 2 - Skin Corr. 1B - Water-react 2
보충제 위험성
Storage Class Code
4.3 - Hazardous materials which set free flammable gases upon contact with water
WGK
WGK 3
Flash Point (°F)
16.0 - 32.0 °F - closed cup
Flash Point (°C)
-8.89 - 0.00 °C - closed cup
이미 열람한 고객
문서
Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition
Spintronics offer breakthroughs over conventional memory/logic devices with lower power, leakage, saturation, and complexity.
The properties of many devices are limited by the intrinsic properties of the materials that compose them.
자사의 과학자팀은 생명 과학, 재료 과학, 화학 합성, 크로마토그래피, 분석 및 기타 많은 영역을 포함한 모든 과학 분야에 경험이 있습니다..
고객지원팀으로 연락바랍니다.