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일반 설명
Tris(dimethylamino)silane is an organosilicon compound with high volatility and thermal stability, widely used as a vapor deposition precursor to fabricate silicon-containing thin films for various applications, including solar cells, fuel cell catalysts, and semiconductors. The depositions can be carried out at low substrate temperatures (<150). The melting point and vapor pressure of TDMAS is in a suitable working range, thus making it a very good vapor deposition precursor.
애플리케이션
Tris(dimethylamino)silane can be used:
- As a silicon source for deposition of aluminum silicate on TiO2 anodes for dye-sensitized solar cells vis atomic layer deposition method.
- As a precursor to fabricate functionalized Si reinforced separators for Li-ion batteries.
신호어
Danger
유해 및 위험 성명서
Hazard Classifications
Acute Tox. 3 Dermal - Acute Tox. 3 Inhalation - Acute Tox. 4 Oral - Eye Dam. 1 - Flam. Liq. 2 - Skin Corr. 1B - Water-react 2
보충제 위험성
Storage Class Code
4.3 - Hazardous materials which set free flammable gases upon contact with water
WGK
WGK 3
Flash Point (°F)
16.0 - 32.0 °F - closed cup
Flash Point (°C)
-8.89 - 0.00 °C - closed cup
이미 열람한 고객
Applied Physics Letters, 63, 3014-3014 (1993)
Thin Solid Films, 519, 270-270 (2011)
Toxicology and industrial health, 5(1), 45-54 (1989-01-01)
The acute handling hazards of tris(dimethylamino)silane [TDMAS] were investigated. The acute male rat peroral LD50 (with 95% confidence limits) was 0.71 (0.51-0.97) ml/kg, and the acute male rabbit percutaneous LD50 was 0.57 (0.35-0.92) ml/kg. The liquid was severely irritating to
문서
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