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Sigma-Aldrich

Tetrakis(ethylmethylamido)zirconium(IV)

≥99.99% trace metals basis

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Synonym(s):
TEMAZ, Tetrakis(ethylmethylamino)zirconium(IV)
Linear Formula:
Zr(NCH3C2H5)4
CAS Number:
Molecular Weight:
323.63
MDL number:
PubChem Substance ID:
NACRES:
NA.23

Quality Level

assay

≥99.99% trace metals basis

form

liquid

reaction suitability

core: zirconium

bp

81 °C/0.1 mmHg (lit.)

density

1.049 g/mL at 25 °C (lit.)

SMILES string

CCN(C)[Zr](N(C)CC)(N(C)CC)N(C)CC

InChI

1S/4C3H8N.Zr/c4*1-3-4-2;/h4*3H2,1-2H3;/q4*-1;+4

InChI key

SRLSISLWUNZOOB-UHFFFAOYSA-N

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This Item
469858725528579211
assay

≥99.99% trace metals basis

assay

99.999% trace metals basis

assay

-

assay

≥99.99% trace metals basis

density

1.049 g/mL at 25 °C (lit.)

density

0.947 g/mL at 25 °C (lit.)

density

1.049 g/mL at 25 °C (lit.)

density

-

bp

81 °C/0.1 mmHg (lit.)

bp

50 °C/0.5 mmHg (lit.)

bp

81 °C/0.1 mmHg (lit.)

bp

-

reaction suitability

core: zirconium

reaction suitability

core: titanium

reaction suitability

core: zirconium, reagent type: catalyst

reaction suitability

core: zirconium

Quality Level

200

Quality Level

200

Quality Level

-

Quality Level

100

Application

Tetrakis(ethylmethylamido)zirconium(IV) can be used as a precursor for atomic layer deposition of zirconium fluoride. These metal fluorides are applied in the field of catalysis, optical films, and protective coatings for Li-ion battery electrodes.

accessory

Product No.
Description
Pricing

pictograms

FlameExclamation mark

signalword

Danger

Hazard Classifications

Eye Irrit. 2 - Flam. Liq. 2 - Skin Irrit. 2 - STOT SE 3 - Water-react 2

target_organs

Respiratory system

Storage Class

4.3 - Hazardous materials, which set free flammable gases upon contact with water

wgk_germany

WGK 3

flash_point_f

50.0 °F - closed cup

flash_point_c

10 °C - closed cup

ppe

Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter


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ZrO2 monolayer as a removable etch stop layer for thermal Al2O3 atomic layer etching using hydrogen fluoride and trimethylaluminum
David R Zywotko, et al.
Chemistry of Materials, 32, 10055-10065 (2020)
Atomic layer deposition of metal fluorides using HF-pyridine as the fluorine precursor
Younghee Lee, et al.
Chemistry of Materials, 28, 2022-2032 (2016)

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