추천 제품
형태
liquid
색상
blue to green
pH
4.8-5.2
유사한 제품을 찾으십니까? 방문 제품 비교 안내
일반 설명
Electroless nickel plating solution (Nickelex) is a type of auto-catalytic plating in which many reactions occur in an aqueous solution without any external power source. Its process includes the catalytic reduction of nickel in an aqueous solution. Nickelex produces an amorphous deposition of nickel in the as-plated condition. It shows properties such as good hardness, corrosion resistance and wear resistance.
Stable electroless nickel plating composition, ready to use, specified for making ohmic contacts to silicon and other semiconductor materials
Advantages
The chemical reaction during the electroless plating process involves an oxidation-reduction reaction between nickelous and hypophosphite ions. The reaction is essentially a two step process occurring simultaneously.
(1) H2PO2- + H2O --> H2OPO3- + H2
(2) Ni ++ (complex) + H2 --> Ni + 2H+
The reaction progresses catalytically with nickel deposition occurring at the operating temperature of 95 °C - 100 °C. The nascent hydrogen evolved insures an oxide free nickel deposit. In addition some NiP formed in a side reaction improves corrosion resistance and solderability. The nickel deposit is highly conductive, remains unstressed, particularly after suitable heat treatment, and shows good adherence.
Advantages
- Stable, ready to use
- Plates without generating ammonia fumes
- Produces quality electrical contacts on p- and n-type silicon
- Does not compensate for p- or n- type conductivity
- Excellent adhesion and solderability
- Plates on silicon, germanium, gallium arsenide, cadmium sulfide
The chemical reaction during the electroless plating process involves an oxidation-reduction reaction between nickelous and hypophosphite ions. The reaction is essentially a two step process occurring simultaneously.
(1) H2PO2- + H2O --> H2OPO3- + H2
(2) Ni ++ (complex) + H2 --> Ni + 2H+
The reaction progresses catalytically with nickel deposition occurring at the operating temperature of 95 °C - 100 °C. The nascent hydrogen evolved insures an oxide free nickel deposit. In addition some NiP formed in a side reaction improves corrosion resistance and solderability. The nickel deposit is highly conductive, remains unstressed, particularly after suitable heat treatment, and shows good adherence.
애플리케이션
Nickelex can be deposited on p-type porous silicon for potential usage in light-emitting diodes (LEDs), and organic solar cells.
Use of Nickelex:
Instructions
Complete metallization procedures are provided for silicon rectifier and planar device fabrication. These procedures should be followed to obtain optimum adhesion of nickel and quality of the ohmic contacts.
- Nickelex provides good mechanical and electrical contacts for semicodonductor devices (silicon rectifers, solar cells, varactors, microwave diodes, transistors, microcircuits, etc.). The quality of the electrical contact is excellent if the surface of silicon is abraded by lapping to increase surface recombination velocity; if the surface is highly doped from diffusion; or if the semicondcutor resistivity is low (0.1 ohm-cm). Nickelex also produces adherent deposits on germanium, gallium arsenide, and cadmium sulfide.
- The Nickelex plate exhibits excellent solderability with lead, tin, and Pb/Sn alloys. Flux can be omitted when furnaced soldered in a hydrogen or non-oxidizing atmosphere.
Instructions
Complete metallization procedures are provided for silicon rectifier and planar device fabrication. These procedures should be followed to obtain optimum adhesion of nickel and quality of the ohmic contacts.
신호어
Danger
Hazard Classifications
Acute Tox. 3 Dermal - Acute Tox. 3 Oral - Acute Tox. 4 Inhalation - Aquatic Acute 1 - Aquatic Chronic 1 - Carc. 1A Inhalation - Eye Irrit. 2 - Muta. 2 - Repr. 1B - Resp. Sens. 1 - Skin Irrit. 2 - Skin Sens. 1 - STOT RE 1
표적 기관
Lungs
Storage Class Code
6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects
WGK
WGK 3
Flash Point (°F)
Not applicable
Flash Point (°C)
Not applicable
이미 열람한 고객
Electroless nickel plating on silicon carbide nanoparticles
Chen Y, et al.
Surface and Coatings Technology, 172(1), 90-94 (2003)
Electroless nickel plating-a review
Loto CA
Silicon, 8(2), 177-186 (2016)
Electroless deposition and silicidation of Ni contacts into p-type Porous Silicon
Andersson HA, et al.
Journal of Porous Materials, 15(3), 335-341 (2008)
Flexible, transparent contacts for inorganic nanostructures and thin films
Turner-Evans DB, et al.
Advanced Materials, 25(29), 4018-4022 (2013)
자사의 과학자팀은 생명 과학, 재료 과학, 화학 합성, 크로마토그래피, 분석 및 기타 많은 영역을 포함한 모든 과학 분야에 경험이 있습니다..
고객지원팀으로 연락바랍니다.