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일반 설명
Tetramethylammonium hydroxide (TMAH), is a commercially available quaternary ammonium base with significantly higher basicity than ammonium hydroxide.
애플리케이션
Tetramethylammonium hydroxide solution (10 wt. % in H2O) can be used as:
TMAH can also be used as an anisotropic etchant for silicon due to its high silicon etching rate. The main advantage of using TMAH is that it causes no danger to electrical circuits due to the absence of alkali ions.
- A reactant to synthesize epoxy-polyhedral oligomeric silsesquioxanes (EPOSS) via sol-gel method using 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane (ECTMS) in IPA.
- An ionic liquid to modify SnO2 nanocrystals, which are applicable as an efficient electron transport layer in perovskite solar cells.
TMAH can also be used as an anisotropic etchant for silicon due to its high silicon etching rate. The main advantage of using TMAH is that it causes no danger to electrical circuits due to the absence of alkali ions.
신호어
Danger
유해 및 위험 성명서
Hazard Classifications
Acute Tox. 1 Dermal - Acute Tox. 3 Oral - Aquatic Chronic 3 - Eye Dam. 1 - Skin Corr. 1B - STOT RE 1 Dermal - STOT SE 1
표적 기관
Central nervous system, Liver,thymus
Storage Class Code
6.1B - Non-combustible acute toxic Cat. 1 and 2 / very toxic hazardous materials
WGK
WGK 3
Flash Point (°F)
Not applicable
Flash Point (°C)
Not applicable
개인 보호 장비
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
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