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Merck
모든 사진(1)

문서

45348

Sigma-Aldrich

Epoxy embedding medium, accelerator

≥95% (NT)

동의어(들):

2,4,6-Tris(dimethylaminomethyl)phenol, Epon DMP 30 substitute, DMP-30

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About This Item

Linear Formula:
[(CH3)2NCH2]3C6H2OH
CAS Number:
Molecular Weight:
265.39
Beilstein:
795751
EC Number:
MDL number:
UNSPSC 코드:
12352100
PubChem Substance ID:
NACRES:
NA.47

vapor density

>1 (vs air)

Quality Level

vapor pressure

<0.01 mmHg ( 21 °C)

분석

≥95% (NT)

형태

solid

색상

colorless to light yellow

refractive index

n20/D 1.516 (lit.)
n20/D 1.517

bp

130-135 °C/1 mmHg (lit.)

density

0.969 g/mL at 25 °C (lit.)

응용 분야

hematology
histology

저장 온도

2-8°C

SMILES string

CN(C)Cc1cc(CN(C)C)c(O)c(CN(C)C)c1

InChI

1S/C15H27N3O/c1-16(2)9-12-7-13(10-17(3)4)15(19)14(8-12)11-18(5)6/h7-8,19H,9-11H2,1-6H3

InChI key

AHDSRXYHVZECER-UHFFFAOYSA-N

유사한 제품을 찾으십니까? 방문 제품 비교 안내

애플리케이션

Epoxy embedding medium, accelerator is used according to the protocol provided for Epoxy Embedding Medium kit, Prod. No. 45359 available on-line. The embedding media is used for electron microscopy.

법적 정보

Epon is a trademark of Hexion, Inc.

관련 제품

제품 번호
설명
가격

픽토그램

CorrosionExclamation mark

신호어

Danger

유해 및 위험 성명서

Hazard Classifications

Acute Tox. 4 Oral - Eye Dam. 1 - Skin Corr. 1B

Storage Class Code

8A - Combustible corrosive hazardous materials

WGK

WGK 1

Flash Point (°F)

300.2 °F - closed cup

Flash Point (°C)

149 °C - closed cup

개인 보호 장비

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter


시험 성적서(COA)

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문서 라이브러리에서 최근에 구매한 제품에 대한 문서를 찾아보세요.

문서 라이브러리 방문

Masashi Yamaguchi et al.
Journal of electron microscopy, 58(4), 261-266 (2009-03-18)
A smart and efficient method for freeze substitution and serial sectioning of yeast cells is described. Yeast cells were placed in a single layer between two copper disks, rapidly frozen, freeze substituted and embedded in an epoxy resin. The cell
S H Brorson
Micron (Oxford, England : 1993), 29(2-3), 89-95 (1998-07-31)
The purpose of this study was to examine how antigen retrieval affected the yield of immunogold labeling on epoxy sections based on embedding with different amounts of accelerator. The concentration of accelerator DMP-30 (tri(dimethyl amino methyl) phenol) was varied in
A Schaper et al.
FEBS letters, 355(1), 91-95 (1994-11-21)
We present recent advances in DNA specimen preparation technique for scanning force microscopy (SFM) based on spreading on mica in the presence of cationic and non-ionic detergents. Reproducible DNA imaging in air and in n-propanol has been achieved in the
L Kanerva et al.
International journal of dermatology, 35(12), 852-856 (1996-12-01)
Epoxy resin compounds (ERC) include a large number of sensitizing chemicals such as epoxy resins (ER), hardeners (curing agents), and reactive diluents. Allergic contact dermatitis (ACD) caused by ERCS is often occupational. We report a patient, sensitized to a hardener
Julien Le Roux et al.
Environmental science & technology, 46(3), 1581-1589 (2012-01-05)
The formation of NDMA and other DBPs (including THMs, HANs, and HKs) has been investigated by chloramination of several tertiary amines in the absence and presence of bromide ion. NDMA formation from the most reactive tertiary amines (e.g., dimethylaminomethylfurfuryl alcohol

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