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235695

Sigma-Aldrich

Octamethylcyclotetrasiloxane

98%

Synonym(s):
2,2,4,4,6,6,8,8-Octamethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane, octamethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane
Linear Formula:
[-Si(CH3)2O-]4
CAS Number:
Molecular Weight:
296.62
Beilstein:
1787074
EC Number:
MDL number:
PubChem Substance ID:
NACRES:
NA.23

vapor density

1 (vs air)

Quality Level

Assay

98%

form

liquid

refractive index

n20/D 1.396 (lit.)

bp

175-176 °C (lit.)

mp

17-18 °C (lit.)

density

0.956 g/mL at 25 °C (lit.)

SMILES string

C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1

InChI

1S/C8H24O4Si4/c1-13(2)9-14(3,4)11-16(7,8)12-15(5,6)10-13/h1-8H3

InChI key

HMMGMWAXVFQUOA-UHFFFAOYSA-N

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1 of 4

This Item
PHR156543883205184
D4 Cyclomethicone Pharmaceutical Secondary Standard; Certified Reference Material

Supelco

PHR1565

D4 Cyclomethicone

Octamethylcyclotetrasiloxane analytical standard

Supelco

43883

Octamethylcyclotetrasiloxane

Hexachlorodisilane 96%

Sigma-Aldrich

205184

Hexachlorodisilane

bp

175-176 °C (lit.)

bp

175-176 °C (lit.)

bp

175-176 °C (lit.)

bp

144-145.5 °C (lit.)

mp

17-18 °C (lit.)

mp

17-18 °C (lit.)

mp

17-18 °C (lit.)

mp

-

density

0.956 g/mL at 25 °C (lit.)

density

0.956 g/mL at 25 °C (lit.)

density

0.956 g/mL at 25 °C (lit.)

density

1.562 g/mL at 25 °C (lit.)

vapor density

1 (vs air)

vapor density

1 (vs air)

vapor density

1 (vs air)

vapor density

-

assay

98%

assay

-

assay

≥97.0% (GC)

assay

96%

General description

Octamethylcyclotetrasiloxane (D4) is a volatile methylsiloxane (VMS) with a relatively low molecular weight. This silicone fluid has a silicon-oxygen bond in a cyclic arrangement and methyl groups are attached to the silicon atom. D4 can be used in the manufacture of silicone based polymers for use in medical devices and personal care products.

Application

D4 can be polymerized through ring opening mechanism with a rare earth solid super acid as a catalyst for potential usage in the synthesis of vinyl coated polydimethylsiloxane (PDMS). It may also be used as a probe liquid for nuclear magnetic resonance cryoporometry (NMRC) to analyze the pore size distribution (PSD) of oil-bearing tight sandstone. Chemical vapor deposition (CVD) of D4 may be utilized for the preparation of siloxane based thin films.

Signal Word

Warning

Hazard Statements

Hazard Classifications

Aquatic Acute 1 - Aquatic Chronic 1 - Flam. Liq. 3 - Repr. 2

Storage Class Code

3 - Flammable liquids

WGK

WGK 3

Flash Point(F)

123.8 °F - closed cup

Flash Point(C)

51 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

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Hexamethylcyclotrisiloxane analytical standard

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38677

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Cyclomethicone 4 United States Pharmacopeia (USP) Reference Standard

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D5 Cyclomethicone Pharmaceutical Secondary Standard; Certified Reference Material

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Hexamethyldisiloxane ≥98%

Sigma-Aldrich

205389

Hexamethyldisiloxane

Hexamethyldisiloxane puriss., ≥98.5% (GC)

Sigma-Aldrich

52630

Hexamethyldisiloxane

Photocatalytic oxidation of octamethylcyclotetrasiloxane (D4): Towards a better understanding of the impact of volatile methyl siloxanes on photocatalytic systems.
Lamaa L, et al.
Applied Catalysis. B, Environmental, 156, 438-446 (2014)
Stephanie Watermann et al.
Metabolites, 11(1) (2021-01-13)
1H NMR spectroscopy, in combination with chemometric methods, was used to analyze the methanol/acetonitrile (1:1) extract of walnut (Juglans Regia L.) regarding the geographical origin of 128 authentic samples from different countries (France, Germany, China) and harvest years (2016-2019). Due
Synthesis of vinyl end-capped polydimethylsiloxane by ring opening polymerization of octamethylcyclotetrasiloxane (D4) catalyzed by rare earth solid super acid SO42-/TiO2/Ln3+.
Yang X, et al.
Polymer International, 63(2), 347-351 (2014)
Applying octamethylcyclotetrasiloxane as a probe liquid for characterizing the pore size distribution of oil-bearing tight sandstones by nuclear magnetic resonance cryoporometry.
Liu Biao, et al.
Marine and Petroleum Geology, 88(2), 814-825 (2017)
Hot-filament chemical vapor deposition of organosilicon thin films from hexamethylcyclotrisiloxane and octamethylcyclotetrasiloxane.
Lewis HGP
Journal of the Electrochemical Society, 148(12), F212-F220 (2001)

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