774030
Zirconium(IV) oxide
sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis (excludes 2% HfO2)
Synonym(s):
Zirconia
About This Item
assay
99.95% trace metals basis (excludes 2% HfO2)
form
powder
reaction suitability
core: zirconium
diam. × thickness
2.00 in. × 0.25 in.
bp
5000 °C (lit.)
mp
2700 °C (lit.)
density
5.89 g/mL at 25 °C (lit.)
SMILES string
O=[Zr]=O
InChI
1S/2O.Zr
InChI key
MCMNRKCIXSYSNV-UHFFFAOYSA-N
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Application
Zirconium oxide sputtering target can be used for physical vapor deposition of zirconia thin films for IT-SOFC, thermal barrier coatings, lead zirconium titanate (PZT) films for sensor applications and other zirconium containing films for different applications.
Storage Class
11 - Combustible Solids
wgk_germany
nwg
flash_point_f
Not applicable
flash_point_c
Not applicable
Certificates of Analysis (COA)
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