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  • A facile two-step etching method to fabricate porous hollow silica particles.

A facile two-step etching method to fabricate porous hollow silica particles.

Journal of colloid and interface science (2012-07-24)
Qingnan Meng, Siyuan Xiang, Kai Zhang, Mingyang Wang, Xinyuan Bu, Pengfei Xue, Liqun Liu, Hongchen Sun, Bai Yang
ABSTRACT

We report here the fabrication of hollow silica particles with mesopores larger than 10nm on their wall via a facile two-step etching method. Different from the conventional template method, the new method uses the silica particles as starting materials, which were synthesized using the well-known Stöber method. In the hollow silica preparation, first, we gently etch the silica particles with a NaOH solution without using template molecules to make them porous. Then, we coat the porous silica particles with poly-dimethyldiallylammonium chloride (PDDA) and treat the PDDA-coated porous silica with an ammonia solution to form the hollow silica nanospheres. In this study, we found that the NaOH dosage and ammonia concentration have significant impact on the morphology of the final products. Adsorption was also studied and results show that the hollow nanospheres can effectively uptake protein-based biomolecules (hemoglobin).

MATERIALS
Product Number
Brand
Product Description

Sigma-Aldrich
Poly(diallyldimethylammonium chloride) solution, average Mw 200,000-350,000 (medium molecular weight), 20 wt. % in H2O
Sigma-Aldrich
Poly(diallyldimethylammonium chloride) solution, average Mw 400,000-500,000 (high molecular weight), 20 wt. % in H2O
Sigma-Aldrich
Poly(diallyldimethylammonium chloride) solution, 20 wt. % in H2O
Sigma-Aldrich
Poly(diallyldimethylammonium chloride) solution, average Mw <100,000 (very low molecular weight), 35 wt. % in H2O