추천 제품
mp
108-112 °C (lit.)
Quality Level
SMILES string
CC(C)C[Si]12O[Si]3(CCCOC(=O)C(C)=C)O[Si]4(CC(C)C)O[Si](CC(C)C)(O1)O[Si]5(CC(C)C)O[Si](CC(C)C)(O2)O[Si](CC(C)C)(O3)O[Si](CC(C)C)(O4)O5
InChI
1S/C35H74O14Si8/c1-27(2)20-51-38-50(19-17-18-37-35(36)34(15)16)39-52(21-28(3)4)43-54(41-51,23-30(7)8)47-57(26-33(13)14)48-55(42-51,24-31(9)10)44-53(40-50,22-29(5)6)46-56(45-52,49-57)25-32(11)12/h27-33H,15,17-26H2,1-14,16H3
InChI key
CVYLJMBNVJQTGW-UHFFFAOYSA-N
일반 설명
PSS-(1-Propylmethacrylate)-Heptaisobutyl substituted silsesquioxane (POSS) is a polyhedral oligomeric silsesquioxane (POSS) with an inorganic-organic cage-like architecture made up of silicon and oxygen.
애플리케이션
PSS-(1-Propylmethacrylate)-Heptaisobutyl substituted can be used as a functional monomer to prepare molecularly imprinted polymers or hybrid monolithic materials (MIPs) via reversible addition-fragmentation chain transfer polymerization (RAFT) or thermally initiated free radical polymerization reactions using suitable template molecules, cross-linker, porogenic solvent, and initiator. The resulting polymeric materials exhibited excellent polymer properties such as high thermal stability, high mechanical stability, low inflammability surface hardening, and oxidation resistance. These POSS nanostructural polymeric materials are commonly used in various biomedical applications, drug delivery, imaging reagents, catalyst supports, enzyme-like catalysis, solid-phase extraction, sensors, and in the chromatographic stationary phase.
Storage Class Code
11 - Combustible Solids
WGK
WGK 3
개인 보호 장비
Eyeshields, Gloves, type N95 (US)
이미 열람한 고객
Talanta, 152, 277-282 (2016-03-20)
Polyhedral oligomeric silsesquioxane (POSS) was successfully applied, for the first time, to prepare imprinted monolithic coating for capillary electrochromatography. The imprinted monolithic coating was synthesized with a mixture of PSS-(1-Propylmethacrylate)-heptaisobutyl substituted (MA 0702), S-amlodipine (template), methacrylic acid (functional monomer), and
Analytical and bioanalytical chemistry, 409(15), 3741-3748 (2017-03-28)
Polyhedral oligomeric silsesquioxane (POSS) was utilized to prepare imprinted polymer through reversible addition-fragmentation chain transfer polymerization (RAFT) successfully. The imprinted polymer was made with a mixture of RAFT agent, 4-vinylpyridine (4-VP), POSS monomer [PSS-(1-propylmethacrylate)-heptaisobutyl substituted, MA 0702], and ethylene glycol
Analytica chimica acta, 761, 209-216 (2013-01-15)
A simple approach to fabricate hybrid monolithic column within the confines of fused-silica capillaries (75 μm i.d.) was introduced. A polyhedral oligomeric silsesquioxanes (POSS) reagent containing a methacrylate group was selected as functional monomer, and copolymerized with bisphenol A dimethacrylate
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