모든 사진(1)
About This Item
Linear Formula:
C7H9RuC7H9
CAS Number:
Molecular Weight:
287.36
MDL number:
UNSPSC 코드:
12352103
PubChem Substance ID:
NACRES:
NA.23
추천 제품
양식
liquid
Quality Level
구성
Ru, 33.9-36.4% gravimetric
반응 적합성
core: ruthenium
reagent type: catalyst
refractive index
n20/D 1.5870 (lit.)
bp
100 °C/0.01 mmHg (lit.)
mp
6 °C (lit.)
density
1.3412 g/mL at 25 °C (lit.)
저장 온도
−20°C
SMILES string
[Ru].CC[C]1[CH][CH][CH][CH]1.CC[C]2[CH][CH][CH][CH]2
InChI
1S/2C7H9.Ru/c2*1-2-7-5-3-4-6-7;/h2*3-6H,2H2,1H3;
InChI key
VLTZUJBHIUUHIK-UHFFFAOYSA-N
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애플리케이션
Bis(ethylcyclopentadienyl)ruthenium(II) (Ru(EtCp)2), a metal organic is used as an atomic layer deposition precursor for Ru thin filmsand well-aligned RuO2 nanorods.
신호어
Warning
유해 및 위험 성명서
Hazard Classifications
Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3
표적 기관
Respiratory system
Storage Class Code
10 - Combustible liquids
WGK
WGK 3
Flash Point (°F)
>199.9 °F - closed cup
Flash Point (°C)
> 93.3 °C - closed cup
개인 보호 장비
Eyeshields, Gloves, type ABEK (EN14387) respirator filter
이미 열람한 고객
ALD-grown seed layers for electrochemical copper deposition integrated with different diffusion barrier systems.
Waechtler T, et al.
Microelectronic Engineering, 88(5), 684-689 (2011)
Thermal atomic layer deposition (ALD) of Ru films for Cu direct plating.
Choi SH, et al.
Journal of the Electrochemical Society, 158(6), D351-D356 (2011)
Growth and characterization of the coexistence of vertically aligned and twinned V-shaped RuO2 nanorods on nanostructural TiO2 template
Chen CA, et al.
J. Alloy Compounds, 485(1-2), 524-528 (2009)
In-situ real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl) ruthenium] and molecular oxygen.
Knaut M, et al.
Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, And Films, 30(1), 01A151-01A151 (2012)
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