667447

Ceramic Etchant A

• 동의어(들): Al₂O₃ Etch, Aluminum Oxide Etchant, GaN Etch, Gallium Nitride Etchant, Si₃N₄ Etch, Silicon Nitride Etchant
• MDL number: MFCD08705343
• UNSPSC 코드: 12352300
• NACRES: NA.23

속성

• Quality Level: 100

설명

애플리케이션

Useful for fast and controllable etching of silicon nitride (Si₃N₄), galium nitride (GaN), or aluminum oxide (Al₂O₃).

특징 및 장점

Etch Rates @ 180 °C:
Aluminum oxide 120 Å/min
Silicon nitride 125 Å/min
Gallium nitride 80 Å/min
Silicon dioxide 1 Å/min
Silicon 1 Å/min

안전성 정보

• 픽토그램: GHS05,GHS07
• 신호어: Danger
• 유해 및 위험 성명서: H290,H302,H314
• 예방조치 성명서: P234 - P270 - P280 - P301 + P312 - P303 + P361 + P353 - P305 + P351 + P338
• Hazard Classifications: Acute Tox. 4 Oral - Eye Dam. 1 - Met. Corr. 1 - Skin Corr. 1B
• Storage Class Code: 8B - Non-combustible corrosive hazardous materials
• WGK: WGK 1
• Flash Point (°F): Not applicable
• Flash Point (°C): Not applicable
• 개인 보호 장비: Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter