651826
Chromium etchant
standard
Synonym(s):
Cr etching solution
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About This Item
Recommended Products
grade
standard
composition
volatiles, 85%
color
orange
bp
100 °C/1 atm
density
1.16 g/mL at 25 °C
General description
- Appearance - Clear orange
- pH - Acidic
- Etch Rate at 40 °C - 40 Å/second
- Etch Capacity (rate declines at ~70%) - 65 g/gallon
- Shelf Life - 1 year
- Storage Conditions - Ambient
- Filtration - 0.2 µm
- Recommended Operating Temperatures - 20-80 °C (30-40 °C most common)
- Rinse - Deionized water
- Photoresist Recommendations - KLT6000 Series, KLT 5300 Series, HARE SQT (SU-8 type), TRANSIST, or PKP -308PI
- Select Compatible Materials - Au, Ti, oxide, nitride, Si
- Select Incompatible Materials - Al, Ni, Cu, NiCr
- Compatible Plastics - HDPE, PP, PTFE, PFA, PVC
- Isotropy - Isotropic
- Incompatible Chemicals - Strong bases
Ceric ammonium nitrate-based etchant. Etch rate of 40 Å/sec @ room temp. Etches cleanly with only a deionized water rinse needed.
Chromium etchant is a chromium based solution that removes the excess metal from the substrate. These etchants are majorly used in metal finishing and electronic industry. It has an etch rate of 4 mm/s and can be used to etch nickel, copper, and chromium based excess metals.
Our chromium etchant is high purity ceric ammonium nitrate system for precise, clean etching of chromium and chromium oxide films. Compatible with positive and negative photoresists. Our chromium etchant is filtered to remove all particulates above 0.2 microns. Etching temperature varies depending on film thickness. Etch times range from 15 seconds to 60 seconds at room temperature. Chromium Etchants should be operated in a well-ventilated hood.
Application
The product can etch Al, Cr, Cu, Ni, GaAs. It can surface oxidize Si, Ta/TaN, however, it has no effect on Au, Si3N4, SiO2, Ti, and W surfaces
For use at room temperature or elevated temperature. Etches cleanly, eliminating need for an intermediate rinse. Etching temperature varies with regard to film thickness. Etch times range from 15 to 60 seconds at room temperature. Note, chromium etchants should be handled in a well ventilated hood.
Features and Benefits
Designed for precise, clean etching of chromium and chromium oxide films. Compatible with both positive and negative photoresists. Filtered to 0.2 micron to remove particlulates.
signalword
Danger
hcodes
Hazard Classifications
Aquatic Chronic 2 - Eye Dam. 1 - Met. Corr. 1 - Ox. Liq. 2 - Skin Corr. 1B - Skin Sens. 1
supp_hazards
Storage Class
5.1B - Oxidizing hazardous materials
wgk_germany
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
Certificates of Analysis (COA)
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Protocols
Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.
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