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651796

Sigma-Aldrich

Negative photoresist I

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About This Item

CAS Number:
9003-31-0
MDL number:
MFCD00084438
UNSPSC Code:
41116107
NACRES:
NA.23

mol wt

average Mw 60,000-70,000 (polyisoprene)

Quality Level

100

composition

solids, 27-29 wt. %

dielectric constant

2.4

surface tension

29.2 dyn/cm

viscosity

465-535 cP(25 °C)

bp

122-142 °C (lit.)

density

0.89 g/mL at 25 °C (lit.)

λmax

310-480 nm

storage temp.

2-8°C

SMILES string

O1C(OCC(C1)(C)C)CCCCCCCC

InChI

1S/C14H28O2/c1-4-5-6-7-8-9-10-13-15-11-14(2,3)12-16-13/h13H,4-12H2,1-3H3

InChI key

UBZVSDZJBLSIJG-UHFFFAOYSA-N

Related Categories

General description

A stabilized, purified photoresist which exhibits superior resolution, adhesion, etch resistance and low pinhole density.
Available as part of Negative Photoresist kit 654892

signalword

Danger

Hazard Classifications

Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Aquatic Chronic 3 - Asp. Tox. 1 - Eye Irrit. 2 - Flam. Liq. 3 - Repr. 1B - Skin Irrit. 2 - STOT SE 3

target_organs

Respiratory system

Storage Class

3 - Flammable liquids

wgk_germany

WGK 3

flash_point_f

75.2 °F - closed cup

flash_point_c

24 °C - closed cup

ppe

Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter

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Certificates of Analysis (COA)

Lot/Batch Number
MKCK5970
MKCJ2028
MKCG8986
MKCJ0922
MKCF2182

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P Voudouris et al.
The Journal of chemical physics, 132(7), 074906-074906 (2010-02-23)
The primary alpha-relaxation time (tau(alpha)) for molecular and polymeric glass formers probed by dielectric spectroscopy and two light scattering techniques (depolarized light scattering and photon correlation spectroscopy) relates to the decay of the torsional autocorrelation function computed by molecular dynamics
Eilhann E Kwon et al.
Environmental science & technology, 46(23), 12921-12926 (2012-11-14)
The thermal degradation of tires under various oxygen concentrations (7-30%/Bal. N(2)) was investigated thermo-gravimetrically at 10 °C min(-1) heating rate over a temperature range from ambient to 1000 °C. Significant mass loss (~55%) was observed at the temperature of 300-500
Chandy Kim et al.
Journal of chromatography. A, 1213(2), 181-188 (2008-11-11)
Natural and synthetic poly(cis-1,4-isoprene) were characterized by size-exclusion chromatography coupled with an online multi-angle light scattering detector (SEC-MALS). Unlike synthetic poly(cis-1,4-isoprene) (SR), natural rubber (NR) samples showed anomalous elution profiles. The beginning of elution was very similar to SR but
Maren Krack et al.
Journal of the American Chemical Society, 130(23), 7315-7320 (2008-05-20)
Magnetic nanoparticles have been assembled into the bilayer membrane of block copolymer vesicles. The nanoparticles decorate the hydrophobic/hydrophilic interface, which leads to bridging of adjacent bilayers and the formation of oligo-lamellar vesicles. The nanoparticle uptake of the vesicles is sufficiently
Carina Schulte et al.
Applied and environmental microbiology, 74(24), 7643-7653 (2008-10-28)
Gordonia westfalica Kb1 and Gordonia polyisoprenivorans VH2 induce the formation of an extracellular superoxide dismutase (SOD) during poly(cis-1,4-isoprene) degradation. To investigate the function of this enzyme in G. polyisoprenivorans VH2, the sodA gene was disrupted. The mutants exhibited reduced growth
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Protocols

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

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