추천 제품
일반 설명
Atomic number of base material: 22 Titanium
애플리케이션
The product is a precursor for the deposition of titanium dioxide thin films by atomic layer deposition with water. Tetrakis(dimethylamido)titanium(IV) (TDMAT) undergoes exothermal reaction with excess cyclopentadiene to yield tris(dimethylamido)(η5-cyclopentadienyl)titanium(IV).
신호어
Danger
유해 및 위험 성명서
Hazard Classifications
Flam. Liq. 2 - Skin Corr. 1B - Water-react 1
보충제 위험성
Storage Class Code
4.3 - Hazardous materials which set free flammable gases upon contact with water
WGK
WGK 3
Flash Point (°F)
-22.0 °F - closed cup
Flash Point (°C)
-30 °C - closed cup
개인 보호 장비
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
이미 열람한 고객
Journal of Applied Physics, 102, 083521/1-083521/1 (2007)
Science of Synthesis: Houben-Weyl Methods of Molecular Transformations, 2, 494-494 (2014)
ACS applied materials & interfaces, 7(28), 15189-15199 (2015-06-18)
Light absorbers with moderate band gaps (1-2 eV) are required for high-efficiency solar fuels devices, but most semiconducting photoanodes undergo photocorrosion or passivation in aqueous solution. Amorphous TiO2 deposited by atomic-layer deposition (ALD) onto various n-type semiconductors (Si, GaAs, GaP
문서
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