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Sigma-Aldrich

Silicon tetraacetate

98%

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Synonym(s):
Tetraacetoxysilane
Linear Formula:
Si(OCOCH3)4
CAS Number:
Molecular Weight:
264.26
Beilstein/REAXYS Number:
994868
EC Number:
MDL number:
UNSPSC Code:
12352100
PubChem Substance ID:
NACRES:
NA.22

vapor density

>1 (vs air)

Quality Level

assay

98%

bp

148 °C/5 mmHg (lit.)

mp

111-115 °C (lit.)

storage temp.

−20°C

SMILES string

CC(=O)O[Si](OC(C)=O)(OC(C)=O)OC(C)=O

InChI

1S/C8H12O8Si/c1-5(9)13-17(14-6(2)10,15-7(3)11)16-8(4)12/h1-4H3

InChI key

YZVRVDPMGYFCGL-UHFFFAOYSA-N

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General description

Silicon tetraacetate is an alternative to silicon hydride and alkoxide for low-temperature SiO2 production. Silicon tetraacetate reacts with ethanol in absence of water to form silica gel and ethyl acetate. Silicon tetraacetate is reported as a sol-gel precursor.

Application

Silicon tetraacetate may be used in the preparation of silicon dioxide thin films by a direct photochemical vapor deposition method. It may be used as starting material in the synthesis of silicon complexes with monofunctional bidentate Schiff bases.

pictograms

Corrosion

signalword

Danger

hcodes

Hazard Classifications

Skin Corr. 1B

wgk_germany

WGK 3

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges


Certificates of Analysis (COA)

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Synthesis of some ketimine derivatives of silicon (IV).
Singh RV and Tandon JP.
J. Prakt. Chem., 321(1), 151-158 (1979)
Silicon tetraacetate as a sol-gel precursor.
Coltrain BK, et al.
Journal of Sol-Gel Science and Technology, 3(2), 83-90 (1994)
Silicon dioxide thin films prepared by chemical vapor deposition from silicon tetraacetate.
Maruyama T and Shionoya J.
Jpn J. App. Phys., Part I, 28(12A), L2253-L2253 (1989)

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