759414

Tetraethyl orthosilicate

packaged for use in deposition systems

• Synonym(s): Tetraethyl orthosilicate, Orthosilicic acid tetraethyl ester, Silicon tetraethoxide, Tetraethoxysilane, Tetraethoxysilicon(IV), Tetraethyl silicate, TEOS
• Linear Formula: Si(OC₂H₅)₄
• CAS Number: 78-10-4
• Molecular Weight: 208.33
• Beilstein/REAXYS Number: 1422225
• EC Number: 201-083-8
• MDL number: MFCD00009062
• UNSPSC Code: 12352103
• PubChem Substance ID: 329766783
• NACRES: NA.23

Properties

• vapor density: 7.2 (vs air)
• Quality Level: 100
• vapor pressure: <1 mmHg ( 20 °C)
• assay: ≥99.5% (GC)
• form: liquid
• refractive index: n20/D 1.382 (lit.)
• bp: 168 °C (lit.)
• density: 0.933 g/mL at 20 °C (lit.)
• SMILES string: CCO[Si](OCC)(OCC)OCC
• InChI: 1S/C8H20O4Si/c1-5-9-13(10-6-2,11-7-3)12-8-4/h5-8H2,1-4H3
• InChI key: BOTDANWDWHJENH-UHFFFAOYSA-N

Description

Application

Tetraethyl orthosilicate (TEOS) is an oxygen containing precursor of Si used for the deposition of:

• Si oxide
• Oxycarbide
• Doped silicate
• Silanol
• Siloxane polymer
• Organosilicon thin films

The films can be deposited at low temperatues (<250 °C). TEOS is also used to deposit mesoporous and nanoporous thin films of silica. These porous films can be doped during deposition to further enhance their properties.

Commonly used as a precursor to prepare xerogel

Will interact with dodecylamine in the formation of intercalation compounds of H⁺-magadiite and used in a study of mixed-metal bioactive glasses.

Safety Information

• pictograms: GHS02,GHS07
• signalword: Warning
• hcodes: H226,H319,H332,H335
• pcodes: P210 - P233 - P240 - P241 - P304 + P340 + P312 - P305 + P351 + P338
• Hazard Classifications: Acute Tox. 4 Inhalation - Eye Irrit. 2 - Flam. Liq. 3 - STOT SE 3
• target_organs: Respiratory system
• Storage Class: 3 - Flammable liquids
• wgk_germany: WGK 1
• flash_point_f: 113.0 °F - closed cup
• flash_point_c: 45 °C - closed cup