759562
Tris(dimethylamino)silane
packaged for use in deposition systems
Synonym(s):
Tris(dimethylamino)silane, (Me2N)3SiH, N,N,N′,N′,N′′, N′′-Hexamethylsilanetriamine, Tris(dimethylamido)silane, N,N,N′,N′,N′′,N′′-Hexamethylsilanetriamine, TDMAS
About This Item
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Quality Level
assay
≥99.9% (GC)
form
liquid
bp
142 °C (lit.)
mp
−90 °C (lit.)
density
0.838 g/mL at 25 °C (lit.)
SMILES string
CN(C)[SiH](N(C)C)N(C)C
InChI
1S/C6H19N3Si/c1-7(2)10(8(3)4)9(5)6/h10H,1-6H3
InChI key
TWVSWDVJBJKDAA-UHFFFAOYSA-N
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General description
Application
- As a silicon source for deposition of aluminum silicate on TiO2 anodes for dye-sensitized solar cells vis atomic layer deposition method.
- As a precursor to fabricate functionalized Si reinforced separators for Li-ion batteries.
signalword
Danger
Hazard Classifications
Acute Tox. 3 Dermal - Acute Tox. 3 Inhalation - Acute Tox. 4 Oral - Eye Dam. 1 - Flam. Liq. 2 - Skin Corr. 1B - Water-react 2
supp_hazards
Storage Class
4.3 - Hazardous materials which set free flammable gases upon contact with water
wgk_germany
WGK 3
flash_point_f
16.0 - 32.0 °F - closed cup
flash_point_c
-8.89 - 0.00 °C - closed cup
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