MilliporeSigma
All Photos(2)

371904

Sigma-Aldrich

1,3-Divinyltetramethyldisiloxane

97%

Sign Into View Organizational & Contract Pricing

Select a Size

Synonym(s):
1,1,3,3-Tetramethyl-1,3-divinyldisiloxane
Linear Formula:
[H2C=CHSi(CH3)2]2O
CAS Number:
Molecular Weight:
186.40
Beilstein:
1762585
EC Number:
MDL number:
PubChem Substance ID:
NACRES:
NA.23

Quality Level

Assay

97%

form

liquid

refractive index

n20/D 1.411 (lit.)

bp

139 °C (lit.)

mp

−99 °C (lit.)

density

0.809 g/mL at 25 °C (lit.)

SMILES string

C[Si](C)(O[Si](C)(C)C=C)C=C

InChI

1S/C8H18OSi2/c1-7-10(3,4)9-11(5,6)8-2/h7-8H,1-2H2,3-6H3

InChI key

BITPLIXHRASDQB-UHFFFAOYSA-N

Compare Similar Items

View Full Comparison

Show Differences

1 of 4

This Item
365157415456409502
form

liquid

form

liquid

form

liquid

form

liquid

refractive index

n20/D 1.411 (lit.)

refractive index

n20/D 1.538 (lit.)

refractive index

n20/D 1.454 (lit.)

refractive index

n20/D 1.511 (lit.)

bp

139 °C (lit.)

bp

96-100 °C/0.1 mmHg (lit.)

bp

148-149 °C (lit.)

bp

106 °C/0.9 mmHg (lit.)

mp

−99 °C (lit.)

mp

-

mp

-

mp

-

density

0.809 g/mL at 25 °C (lit.)

density

0.985 g/mL at 25 °C (lit.)

density

1.005 g/mL at 25 °C (lit.)

density

1.06 g/mL at 25 °C (lit.)

Pictograms

Flame

Signal Word

Danger

Hazard Statements

Hazard Classifications

Flam. Liq. 2

Storage Class Code

3 - Flammable liquids

WGK

WGK 3

Flash Point(F)

71.1 °F - closed cup

Flash Point(C)

21.7 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

Already Own This Product?

Documents related to the products that you have purchased in the past have been gathered in the Document Library for your convenience.

Visit the Document Library

Difficulty Finding Your Product Or Lot/Batch Number?

Product numbers are combined with Pack Sizes/Quantity when displayed on the website (example: T1503-25G). Please make sure you enter ONLY the product number in the Product Number field (example: T1503).

Example:

T1503
Product Number
-
25G
Pack Size/Quantity

Additional examples:

705578-5MG-PW

PL860-CGA/SHF-1EA

MMYOMAG-74K-13

1000309185

enter as 1.000309185)

Having trouble? Feel free to contact Technical Service for assistance.

Lot and Batch Numbers can be found on a product's label following the words 'Lot' or 'Batch'.

Aldrich Products

  • For a lot number such as TO09019TO, enter it as 09019TO (without the first two letters 'TO').

  • For a lot number with a filling-code such as 05427ES-021, enter it as 05427ES (without the filling-code '-021').

  • For a lot number with a filling-code such as STBB0728K9, enter it as STBB0728 without the filling-code 'K9'.

Not Finding What You Are Looking For?

In some cases, a COA may not be available online. If your search was unable to find the COA you can request one.

Request COA

Customers Also Viewed

Charles A Ault et al.
Macromolecular rapid communications, 42(5), e2000692-e2000692 (2021-01-28)
Effects of molecular weight of methylphenyl-containing vinylsiloxy-functionalized terpolysiloxanes on their UV-activated crosslinking by hydrosilylation at room temperature in air, shelf life stability of "all-in-one" pastes prepared from them for additive manufacturing, and mechanical properties of the resulting crosslinked elastomers, are
B Sivaranjini et al.
Scientific reports, 8(1), 8891-8891 (2018-06-13)
A simple and effective approach for vertical alignment of liquid crystals (LCs) over a functionalized transparent flexible substrate is described. Surface characterization of this commercially available plastic substrate through X-ray photoelectron spectroscopy (XPS) and attenuated total reflection infrared spectroscopy (ATR-IR)
Seungmin Shin et al.
Nanotechnology, 27(47), 475301-475301 (2016-10-27)
Novel polyhedral oligomeric silsesquioxane (POSS) resists, which are based on a new photo-crosslinking system via Wolff rearrangement, are developed as ideal replica mold materials for ultraviolet-nanoimprint lithography. These POSS resist materials are synthesized by incorporating diazoketo and hydroxyl groups into
Katharina Thum et al.
Chemistry (Weinheim an der Bergstrasse, Germany), 27(7), 2513-2522 (2020-11-17)
The first intermolecular early main group metal-alkene complexes were isolated. This was enabled by using highly Lewis acidic Mg centers in the Lewis base-free cations (Me BDI)Mg+ and (tBu BDI)Mg+ with B(C6 F5 )4 - counterions (Me BDI=CH[C(CH3 )N(DIPP)]2
Ilya Borisov et al.
Polymers, 12(6) (2020-05-30)
For the first time, the effect of the side-chain in polyalkylmethylsiloxane towards pervaporative removal of methyl tert-butyl ether (MTBE) from water was studied. The noticeable enhancement of separation factor during the pervaporation of 1 wt.% MTBE solution in water through

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service