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553468

Sigma-Aldrich

Tris(tert-butoxy)silanol

99.999%

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Synonym(s):
TBS
Linear Formula:
((CH3)3CO)3SiOH
CAS Number:
Molecular Weight:
264.43
MDL number:
PubChem Substance ID:
NACRES:
NA.23

Quality Level

assay

99.999%

form

solid

bp

205-210 °C (lit.)

mp

63-65 °C (lit.)

SMILES string

CC(C)(C)O[Si](O)(OC(C)(C)C)OC(C)(C)C

InChI

1S/C12H28O4Si/c1-10(2,3)14-17(13,15-11(4,5)6)16-12(7,8)9/h13H,1-9H3

InChI key

HLDBBQREZCVBMA-UHFFFAOYSA-N

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Show Differences

1 of 4

This Item
360716553441902489
vibrant-m

553468

Tris(tert-butoxy)silanol

vibrant-m

360716

Tris(trimethylsilyl)silane

vibrant-m

553441

Tris(tert-pentoxy)silanol

vibrant-m

902489

Tris(trimethylsilyl)silanol

form

solid

form

liquid

form

liquid

form

liquid

mp

63-65 °C (lit.)

mp

-

mp

-

mp

-

bp

205-210 °C (lit.)

bp

73 °C/5 mmHg (lit.)

bp

96-99 °C/2-3 mmHg (lit.)

bp

-

Quality Level

100

Quality Level

100

Quality Level

100

Quality Level

-

General description

Tris(tert-butoxy)silanol can react with various metal alkyl amides to act as precursors for vapor deposition metal silicates. It also acts as a suitable precursor for deposition of silica.

Application

Tris(tert-alkoxy)silanols reacts with tetrakis(dimethylamino)-hafnium vapor(Hf(N(CH3)2)4) for vapor phase deposition of hafnium silicate glass films. Tris(tert-butoxy)silanol is used for atomic layer deposition (ALD) of highly conformal layers of amorphous silicon dioxide and aluminum oxide nanolaminates.

Storage Class

11 - Combustible Solids

wgk_germany

WGK 3

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Eyeshields, Gloves, type N95 (US)


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Rapid vapor deposition of highly conformal silica nanolaminates.
Hausmann D, et al.
Science, 298(5592), 402-406 null
Rapid SiO2 Atomic Layer Deposition Using Tris(tert-pentoxy)silanol.
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Chemistry of Materials, 20, 7031-7043 (2008)
Vapor deposition of metal oxides and silicates: Possible gate insulators for future microelectronics.
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Chemistry of Materials, 13(8), 2463-2464 (2001)
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