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MilliporeSigma

556688

Sigma-Aldrich

Dimethoxydimethylsilane

≥99.5%, 99.999% metals basis

Synonym(s):

Dimethyldimethoxysilane

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About This Item

Linear Formula:
Si(OCH3)2(CH3)2
CAS Number:
1112-39-6
Molecular Weight:
120.22
Beilstein/REAXYS Number:
1733694
EC Number:
214-189-4
MDL number:
MFCD00025691
UNSPSC Code:
12352103
PubChem Substance ID:
24879572
NACRES:
NA.22

Key Documents

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Quality Level

100

assay

≥99.5%
99.999% metals basis

form

liquid

refractive index

n20/D 1.369 (lit.)

bp

81.4 °C (lit.)

density

0.88 g/mL at 25 °C (lit.)

SMILES string

CO[Si](C)(C)OC

InChI

1S/C4H12O2Si/c1-5-7(3,4)6-2/h1-4H3

InChI key

JJQZDUKDJDQPMQ-UHFFFAOYSA-N

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Related Categories

pictograms

Flame
GHS02

signalword

Danger

hcodes

H225

Hazard Classifications

Flam. Liq. 2

Storage Class

3 - Flammable liquids

wgk_germany

WGK 3

flash_point_f

50.0 °F - closed cup

flash_point_c

10 °C - closed cup

ppe

Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter

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Certificates of Analysis (COA)

Lot/Batch Number
SHBP4211
SHBK5307
SHBC4321V
12711HO

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C Wyatt Shields et al.
Journal of controlled release : official journal of the Controlled Release Society, 278, 37-48 (2018-04-01)
Retinol, a derivative of vitamin A, is a ubiquitous compound used to treat acne, reduce wrinkles and protect against conditions like psoriasis and ichthyosis. While retinol is used as the primary active ingredient (AI) in many skin care formulations, its
Chiara Micalella et al.
Biotechnology and applied biochemistry, 61(3), 297-303 (2014-02-28)
Enzymes entrapped in wet, nanoporous silica gel have great potential as bioreactors for bioremediation because of their improved thermal, chemical, and mechanical stability with respect to enzymes in solution. The B isozyme of catechol 1,2 dioxygenase from Acinetobacter radioresistens and

Articles

Synthesis of Melting Gels Using Mono-Substituted and Di-Substituted Alkoxysiloxanes

Synthesis of Melting Gels Using Mono-Substituted and Di-Substituted Alkoxysiloxanes

Silicon Nitride Atomic Layer Deposition: A Brief Review of Precursor Chemistry

atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer

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