Skip to Content
MilliporeSigma
All Photos(2)

Documents

663301

Sigma-Aldrich

Trimethylaluminum

packaged for use in deposition systems

Synonym(s):

Aluminum trimethanide, TMA

Sign Into View Organizational & Contract Pricing
All Photos(2)

About This Item

Linear Formula:
(CH3)3Al
CAS Number:
75-24-1
Molecular Weight:
72.09
Beilstein/REAXYS Number:
3587197
EC Number:
200-853-0
MDL number:
MFCD00008252
UNSPSC Code:
12352103
PubChem Substance ID:
24884629
NACRES:
NA.23

vapor pressure

69.3 mmHg ( 60 °C)

description

heat of vaporization: ~41.9 kJ/mol (Dimer)

form

liquid

reaction suitability

core: aluminum

bp

125-126 °C (lit.)
127 °C/760 mmHg
20 °C/8 mmHg
56 °C/50 mmHg

mp

15 °C (lit.)

density

0.752 g/mL at 25 °C (lit.)

SMILES string

C[Al](C)C

InChI

1S/3CH3.Al/h3*1H3;

InChI key

JLTRXTDYQLMHGR-UHFFFAOYSA-N

Looking for similar products? Visit Product Comparison Guide

Related Categories

General description

Trimethylaluminum ismainly used in the industrial production of polyethylene and other syntheticpolymers, where it is used as a co-catalyst for the polymerization reaction. Itis also used as a precursor to produce inorganic aluminum compounds, includingalumina and various zeolites.

Application

Precursors Packaged for Depositions Systems
Trimethylaluminum can be used as:
  • A chemical vapor deposition precursor to fabricate PbSe quantum dot solids for optoelectronic devices.
  • An aluminum precursor for the flame synthesis of alumina nanofibers.
  • A reagent for efficient synthesis of allenes.

pictograms

FlameCorrosion
GHS02,GHS05

signalword

Danger

Hazard Classifications

Eye Dam. 1 - Pyr. Liq. 1 - Skin Corr. 1B - Water-react 1

supp_hazards

EUH014

Storage Class

4.2 - Pyrophoric and self-heating hazardous materials

wgk_germany

nwg

flash_point_f

No data available

flash_point_c

No data available

ppe

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

Formation of alumina nanofibers in carbon-containing coflow laminar diffusion flames
Bing Guo, et al.
Journal of Aerosol Science, 40, 379-384 (2009)
Highly efficient synthesis of allenes from trimethylaluminum reagent and propargyl acetates mediated by a palladium catalyst
Qing-Han Li, et al.
European Journal of Organic Chemistry, 2014, 7916-7923 (2014)
J L L Robinson et al.
Oncogene, 33(50), 5666-5674 (2013-12-03)
Castration-resistant prostate cancer (CRPC) continues to pose a significant clinical challenge with new generation second-line hormonal therapies affording limited improvement in disease outcome. As the androgen receptor (AR) remains a critical driver in CRPC, understanding the determinants of its transcriptional
Shahram Khosravi et al.
The Journal of investigative dermatology, 135(5), 1358-1367 (2015-01-07)
Human cutaneous melanoma is a devastating skin cancer because of its invasive nature and high metastatic potential. We used tissue microarray to study the role of human eukaryotic translation initiation factor 4E (eIF4E) in melanoma progression in 448 melanocytic lesions
J Stebbing et al.
Oncogene, 34(16), 2103-2114 (2014-06-10)
Kinase suppressor of Ras-1 (KSR1) facilitates signal transduction in Ras-dependent cancers, including pancreatic and lung carcinomas but its role in breast cancer has not been well studied. Here, we demonstrate for the first time it functions as a tumor suppressor
View All Related Papers

Articles

Atomic Layer Deposition (ALD)

Atomic layer deposition (ALD) showcases innovation in novel structure synthesis, area-selective deposition, low-temperature deposition, and more.

Molecular Layer Deposition of Polymers

Atomic layer deposition meets various needs including semiconductor device miniaturization and nanoparticle coating.

Savannah ALD System for Atomic Layer Deposition

Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.

Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition

Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition

See All

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service