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  • Photopatterning of cross-linkable epoxide-functionalized block copolymers and dual-tone nanostructure development for fabrication across the nano- and microscales.

Photopatterning of cross-linkable epoxide-functionalized block copolymers and dual-tone nanostructure development for fabrication across the nano- and microscales.

Small (Weinheim an der Bergstrasse, Germany) (2015-01-23)
Chunlin He, Mark P Stoykovich
ABSTRACT

The self-assembly of block copolymers in thin films provides an attractive approach to patterning 5-100 nm structures. Cross-linking and photopatterning of the self-assembled block copolymer morphologies provide further opportunities to structure such materials for lithographic applications, and to also enhance the thermal, chemical, or mechanical stability of such nanostructures to achieve robust templates for subsequent fabrication processes. Here, model lamellar-forming diblock copolymers of polystyrene and poly(methyl methacrylate) with an epoxide functionality are synthesized by atom transfer radical polymerization. We demonstrate that self-assembly and cross-linking of the reactive block copolymer materials in thin films can be decoupled into distinct, controlled process steps using solvent annealing and thermal treatment/ultraviolet exposure, respectively. Conventional optical lithography approaches can also be applied to the cross-linkable block copolymer materials in thin films and enable simultaneous structure formation across scales-micrometer scale patterns achieved by photolithography and nanostructures via self-assembly of the block copolymer. Such materials and processes are thus shown to be capable of self-assembling distinct block copolymers (e.g., lamellae of significantly different periodicity) in adjacent regions of a continuous thin film.

MATERIALS
Product Number
Brand
Product Description

Sigma-Aldrich
Glycidyl methacrylate, ≥97.0% (GC)
Sigma-Aldrich
Glycidyl methacrylate, 97%, contains 100 ppm monomethyl ether hydroquinone as inhibitor
Sigma-Aldrich
(1-Bromoethyl)benzene, 97%
Sigma-Aldrich
Cyclohexane, suitable for HPLC
Sigma-Aldrich
Methyl methacrylate, SAJ first grade, ≥99.0%
Sigma-Aldrich
Styrene, SAJ first grade, ≥99.0%
Sigma-Aldrich
Cyclohexane, SAJ first grade, ≥99.0%
Sigma-Aldrich
Cyclohexane, JIS special grade
Sigma-Aldrich
Styrene, ReagentPlus®, contains 4-tert-butylcatechol as stabilizer, ≥99%
Sigma-Aldrich
Methyl methacrylate, contains ≤30 ppm MEHQ as inhibitor, 99%
Sigma-Aldrich
Tetrahydrofuran, suitable for HPLC, ≥99.9%, inhibitor-free
Sigma-Aldrich
Acetone, natural, ≥97%
Sigma-Aldrich
Tetrahydrofuran, anhydrous, ≥99.9%, inhibitor-free
Sigma-Aldrich
Cyclohexane, anhydrous, 99.5%
Sigma-Aldrich
Tetrahydrofuran, anhydrous, contains 250 ppm BHT as inhibitor, ≥99.9%
Sigma-Aldrich
Acetone, suitable for HPLC, ≥99.9%
Sigma-Aldrich
Acetone, ≥99%, meets FCC analytical specifications
Sigma-Aldrich
Acetone, for chromatography, ≥99.8%
Sigma-Aldrich
Tetrahydrofuran, suitable for HPLC, contains no stabilizer
Sigma-Aldrich
Acetone, SAJ first grade, ≥99.0%
Sigma-Aldrich
Tetrahydrofuran, SAJ first grade, ≥99.0%
Sigma-Aldrich
Acetone, for residue analysis, JIS 5000
Sigma-Aldrich
Acetone, suitable for HPLC
Sigma-Aldrich
Acetone, for residue analysis, ≥99.5%
Sigma-Aldrich
Acetone, JIS special grade, ≥99.5%
Sigma-Aldrich
Acetone, ≥99.5%, for residue analysis
Sigma-Aldrich
Methyl methacrylate, 99%, stabilized
Sigma-Aldrich
Tetrahydrofuran, JIS special grade, ≥99.5%
Sigma-Aldrich
Bromine, SAJ first grade, ≥97.0%
Sigma-Aldrich
Bromine, JIS special grade, ≥99.0%