추천 제품
Quality Level
분석
≥97.0% (GC)
형태
liquid
refractive index
n20/D 1.444
bp
66 °C/27 mmHg (lit.)
density
1.026 g/mL at 20 °C (lit.)
SMILES string
CC(C)[Si](Cl)(Cl)C(C)C
InChI
1S/C6H14Cl2Si/c1-5(2)9(7,8)6(3)4/h5-6H,1-4H3
InChI key
GSENNYNYEKCQGA-UHFFFAOYSA-N
기타 정보
Protecting group reagent; brings two alcohols in close contact for "tethering technique"
신호어
Danger
유해 및 위험 성명서
Hazard Classifications
Flam. Liq. 3 - Skin Corr. 1B
Storage Class Code
3 - Flammable liquids
WGK
WGK 3
Flash Point (°F)
109.4 °F - closed cup
Flash Point (°C)
43 °C - closed cup
개인 보호 장비
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
이미 열람한 고객
Tetrahedron Letters, 32, 573-573 (1991)
Tetrahedron Letters, 36, 4189-4189 (1995)
Nature communications, 9(1), 2788-2788 (2018-07-19)
Existing photoresists for 3D laser lithography that can be removed after development in a subtractive manner typically suffer from harsh cleavage conditions. Here, we report chemoselectively cleavable photoresists for 3D laser lithography based on silane crosslinkers, allowing the targeted degradation
자사의 과학자팀은 생명 과학, 재료 과학, 화학 합성, 크로마토그래피, 분석 및 기타 많은 영역을 포함한 모든 과학 분야에 경험이 있습니다..
고객지원팀으로 연락바랍니다.