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Merck
모든 사진(2)

주요 문서

697540

Sigma-Aldrich

Trimethyl(methylcyclopentadienyl)platinum(IV)

packaged for use in deposition systems

동의어(들):

MeCpPtMe3

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About This Item

Linear Formula:
C5H4CH3Pt(CH3)3
CAS Number:
Molecular Weight:
319.30
UNSPSC 코드:
12352103
NACRES:
NA.23

Quality Level

형태

low-melting solid

반응 적합성

core: platinum
reagent type: catalyst

mp

30-31 °C (lit.)

저장 온도

2-8°C

SMILES string

C[Pt](C)C.C[C]1[CH][CH][CH][CH]1

InChI

1S/C6H7.3CH3.Pt/c1-6-4-2-3-5-6;;;;/h2,4H,3H2,1H3;3*1H3;

InChI key

AGQKROMSWCHOND-UHFFFAOYSA-N

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일반 설명

Trimethyl(methylcyclopentadienyl)platinum(IV) pale yellow or off-white crystalline organometallic complex widely used as a chemical vapor deposition/atomic layer deposition precursor to deposit platinum on various substrates.

애플리케이션

Trimethyl(methylcyclopentadienyl)platinum(IV) used:
  • As a precursor to prepare Pt nanoparticles. It helps in tuning the particle size for better activity and stability of the Pt catalyst.
  • To fabricate cathodes for solid acid fuel cells with high activity and excellent stability.
  • To prepare triple helical nanowires(THN) for advanced nanophotonics.
  • To fabricate Pt current collectors for electrodes of asymmetric V2O5–SnO2 nanopore battery.
  • As a precursor for synthesis of Platinum catalystwith high loadings of uniform-sized, 1−2 nm Ptnanoparticles on high surface area Al2O3, TiO2, and SrTiO3 supports. The synthesis ofcatalytic nanoparticles via ALD is a compelling technique for creatinginnovative and useful catalysts.
Precursors Packaged for Depositions Systems

픽토그램

Skull and crossbonesEnvironment

신호어

Danger

유해 및 위험 성명서

Hazard Classifications

Acute Tox. 1 Oral - Acute Tox. 2 Dermal - Aquatic Acute 1 - Skin Sens. 1

Storage Class Code

6.1A - Combustible acute toxic Cat. 1 and 2 / very toxic hazardous materials

WGK

WGK 3

개인 보호 장비

Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges


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시험 성적서(COA)

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문서 라이브러리에서 최근에 구매한 제품에 대한 문서를 찾아보세요.

문서 라이브러리 방문

Genesis and evolution of surface species during Pt atomic layer deposition on oxide supports characterized by in situ XAFS analysis and water- gas shift reaction
Worajit Setthapun, et al.
The Journal of Physical Chemistry C, 114, 9758-9771 (2010)
High performance asymmetric V2O5-SnO2 nanopore battery by atomic layer deposition
Chanyuan Liu, et al.
Nanoscale, 9, 11566-11573 (2017)
Atomic layer deposition of Pt@CsH2PO4 for the cathodes of solid acid fuel cells
Dae-Kwang Lim, et al.
Electrochimica Acta, 288, 12-19 (2018)
Triple-helical nanowires by tomographic rotatory growth for chiral photonics
Marco Esposito, et al.
Nature Communications, 6, 6484-6484 (2015)
Size-controlled platinum nanoparticles prepared by modified-version atomic layer deposition for ethanol oxidation
Ruey-Shin Juang, et al.
Journal of Power Sources, 275, 845-851 (2015)

문서

Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.

Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition

Continuous efficiency improvements in photovoltaic devices result from material advancements and manufacturing innovation.

High Purity Metalorganic Precursors for CPV Device Fabrication

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