추천 제품
Quality Level
분석
98%
형태
powder
반응 적합성
reagent type: catalyst
core: tantalum
density
4.74 g/mL at 25 °C (lit.)
SMILES string
F[Ta](F)(F)(F)F
InChI
1S/5FH.Ta/h5*1H;/q;;;;;+5/p-5
InChI key
YRGLXIVYESZPLQ-UHFFFAOYSA-I
일반 설명
Tantalum(V) fluoride is a volatile inorganiccompound widely used as a precursor for atomic layer deposition, to producemetal fluoride thin films and as a catalyst in various organic transformations.
애플리케이션
Tantalum(V) fluoride can be used:
- As a precursor for atomic layer deposition of thin films on the cathode materials of Li-ion batteries.
- As a dopant to enhance the photochemical activity of hematite by improving charge carrier mobility and reducing recombination of photogenerated holes and electrons.
- To enhance the photocurrent stability and photoluminescence of WO3 films (used as photoelectrode for photolysis of water).
- As a catalyst for N-alkylation of arylamines with benzylalcohols.
신호어
Danger
유해 및 위험 성명서
Hazard Classifications
Eye Dam. 1 - Skin Corr. 1B
Storage Class Code
8B - Non-combustible corrosive hazardous materials
WGK
WGK 3
Flash Point (°F)
Not applicable
Flash Point (°C)
Not applicable
개인 보호 장비
Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges
이미 열람한 고객
Improvement of Hematite as Photocatalyst by Doping with Tantalum
The Journal of Physical Chemistry C, 118, 16842-16850 (2014)
Influence of tantalum dopant ions (Ta5+) on the efficiency of the tungsten trioxide photoelectrode
Physica Status Solidi (A): Applied Research, 205, 2038-2041 (2008)
Applications and Advantages of Atomic Layer Deposition for Lithium-Ion Batteries Cathodes
Lithium-Ion Batteries, 8, 184-184 (2022)
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