コンテンツへスキップ
Merck
  • An alternative SEM drying method using hexamethyldisilazane (HMDS) for microbial cell attachment studies on sub-bituminous coal.

An alternative SEM drying method using hexamethyldisilazane (HMDS) for microbial cell attachment studies on sub-bituminous coal.

Journal of microbiological methods (2012-05-09)
Nur Hazlin Hazrin-Chong, Mike Manefield
要旨

The use of hexamethyldisilazane (HMDS) as a drying agent was investigated in the specimen preparation for scanning electron microscopy (SEM) imaging of bacterial surface colonization on sub-bituminous coal. The ability of microbes to biofragment, ferment and generate methane from coal has sparked interest in the initial attachment and colonization of coal surfaces. HMDS represents an attractive alternative to critical point drying (CPD) in the imaging of cells on coal, negating the need for expensive equipment. Coal is easily fragmented into sub-micron particles, which can be problematic in critical point drying procedures. In this study, both individual and aggregated cells appeared well shaped with minimal occurrence of flattened cells, signifying the suitability of HMDS in cell attachment studies on sub-bituminous coal. In the absence of glucose, microcolonies of short and long cells showed similar positive results using this method. EPS shrinkage found in microcolonies was inevitable, though this enabled observation of points of attachment between cells and with coal, which would be less effective if the EPS was intact. Overall the use of HMDS drying is preferred over the more commonly used CPD method as it is safer, cheaper and more practical.

材料
製品番号
ブランド
製品内容

Sigma-Aldrich
リチウムビス(トリメチルシリル)アミド 溶液, 1.0 M in THF
Sigma-Aldrich
ヘキサメチルジシラザン, reagent grade, ≥99%
Sigma-Aldrich
ナトリウムビス(トリメチルシリル)アミド 溶液, 1.0 M in THF
Sigma-Aldrich
カリウム ビス(トリメチルシリル)アミド 溶液, 1 M in THF
Sigma-Aldrich
リチウムビス(トリメチルシリル)アミド, 97%
Sigma-Aldrich
ヘキサメチルジシラザン, ReagentPlus®, 99.9%
Sigma-Aldrich
カリウムビス(トリメチルシリル)アミド, 95%
Sigma-Aldrich
リチウムビス(トリメチルシリル)アミド 溶液, 1 M in toluene
Sigma-Aldrich
ナトリウムビス(トリメチルシリル)アミド, 95%
Sigma-Aldrich
リチウムビス(トリメチルシリル)アミド 溶液, 1.5 M in THF
Sigma-Aldrich
カリウム ビス(トリメチルシリル)アミド 溶液, 0.5 M in toluene
Sigma-Aldrich
ナトリウムビス(トリメチルシリル)アミド 溶液, 40% in THF
Sigma-Aldrich
リチウムビス(トリメチルシリル)アミド 溶液, 1.0 M in hexanes
Sigma-Aldrich
カリウム ビス(トリメチルシリル)アミド 溶液, 1.0 M in 2-methyltetrahydrofuran
Sigma-Aldrich
Tris[N,N-bis(trimethylsilyl)amide]yttrium
Sigma-Aldrich
ナトリウムビス(トリメチルシリル)アミド 溶液, 0.6 M in toluene
Sigma-Aldrich
リチウムビス(トリメチルシリル)アミド 溶液, 0.5 M in 2-methyltetrahydrofuran
Supelco
ヘキサメチルジシラザン, for GC derivatization, LiChropur, ≥99.0% (GC)
Sigma-Aldrich
リチウムビス(トリメチルシリル)アミド 溶液, 1 M in tert-butyl methyl ether
Sigma-Aldrich
トリス[N,N-ビス(トリメチルシリル)アミド]サマリウム(III), 98%
Sigma-Aldrich
ヘキサメチルジシラザン, produced by Wacker Chemie AG, Burghausen, Germany, ≥97.0% (GC)